Formation of size controlled Ge nanocrystals in SiO 2 matrix by ion implantation and annealing

Author： Yamamoto M.   Koshikawa T.   Yasue T.   Harima H.   Kajiyama K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 100-103

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