Doped vs. undoped Si 1-x-y Ge x C y layers in sub-100 nm vertical p-channel MOSFETs

Author: Yang M.   Sturm J.C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.369, Iss.1, 2000-07, pp. : 366-370

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Abstract