Free carrier optical absorption used to analyze the electrical properties of polycrystalline silicon films formed by plasma enhanced chemical vapor deposition

Author: Watanabe T.   Sameshima T.   Nakahata K.   Kamiya T.   Shimizu I.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.383, Iss.1, 2001-02, pp. : 248-250

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