Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

Author： Baa I. Fernandes B. Nunes P. Quintela M. Martins R.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.383, Iss.1, 2001-02, pp. : 244-247

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