Is the nucleation and coalescence behavior in the growth of a-Si:H films prepared by the CAT-CVD different?

Author： Dusane R.O.   Bauer S.   Schroder B.   Oechsner H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.395, Iss.1, 2001-09, pp. : 121-124

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