Annealing behavior of electrical properties in plasma-exposed Ti/p-Si interfaces

Author： Yamaguchi T.   Kato H.   Fujimura N.   Ito T.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.396, Iss.1, 2001-09, pp. : 119-125

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