Author: Yanaka M. Henry B.M. Roberts A.P. Grovenor C.R.M. Briggs G.A.D. Sutton A.P. Miyamoto T. Tsukahara Y. Takeda N. Chater R.J.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.397, Iss.1, 2001-10, pp. : 176-185
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
SrRu 1-x Fe x O 3 films coated with SiO 2 nano-particles
By Park J.-C. Kim I.-G. Kim D. Lee C.-S.
Thin Solid Films, Vol. 441, Iss. 1, 2003-09 ,pp. :
Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures
By Alayo M.I. Pereyra I. Carreno M.N.P.
Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. :
Physical properties of plasma deposited SiO x thin films
By San Andres E. del Prado A. Martil I. Gonzalez G. Martnez F.L. Bravo D. Lopez F.J. Fernandez M.
Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. :