A simple low-temperature laser-doping employing phosphosilicate glass and borosilicate glass films for the source and drain formation in poly-Si thin film transistors

Author： Kim C.-H.   Jung S.-H.   Jeon J.-H.   Han M.-K.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.397, Iss.1, 2001-10, pp. : 4-7

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