Author: Hobbs K.R. Coombe R.D.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.402, Iss.1, 2002-01, pp. : 162-166
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Atomic layer deposition of BN thin films
By Marlid B. Ottosson M. Pettersson U. Larsson K. Carlsson J.-O.
Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. :
Plasma-assisted deposition of tungsten-containing siloxane thin films
By Fracassi F. d'Agostino R. Palumbo F. Bellucci F. Monetta T.
Thin Solid Films, Vol. 264, Iss. 1, 1995-08 ,pp. :
Atomic layer deposition of ultrathin and conformal Al 2 O 3 films on BN particles
By Ferguson J.D. Weimer A.W. George S.M.
Thin Solid Films, Vol. 371, Iss. 1, 2000-08 ,pp. :
Computer simulation of transition from h-BN TO c-BN during ion beam assisted deposition
By Kharlamov V.S. Kulikov D.V. Trushin Y.V.
Vacuum, Vol. 52, Iss. 4, 1999-04 ,pp. :