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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

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Parameters determining crystallinity in -SiC thin films prepared by catalytic chemical vapor deposition

By Zhao Q.   Li J.C.   Zhou H.   Wang H.   Wang B.   Yan H.  

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Mechanical properties of a-C:H and a-C:H/SiO x nanocomposite thin films prepared by ion-assisted plasma-enhanced chemical vapor deposition

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Effects of chlorine on tribological properties of TiN films prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

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