The effect of pressure control on a thermally stable a-C:N thin film with low dielectric constant by electron cyclotron resonance-plasma

Author： Liu X.W.   Lin J.H.   Jong W.J.   Shih H.C.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.409, Iss.2, 2002-04, pp. : 178-184

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