A new class of Ti-Si-C-N coatings obtained by chemical vapor deposition, Part III: 650-800 o C process

Author: Kuo D.-H.   Liao W.-C.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.419, Iss.1, 2002-11, pp. : 11-17

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Abstract