Conductivity and dielectric properties of silicon nitride thin films prepared by RF magnetron sputtering using nitrogen gas

Author： Awan S.A.   Gould R.D.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.423, Iss.2, 2003-01, pp. : 267-272

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering

By Futsuhara M.   Yoshioka K.   Takai O.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 274-281

Elsevier

Access to resources Recommend Favorite

Compositional characterization of silicon nitride thin films prepared by RF-sputtering

By Vila M.   Martn-Gago J.A.   Munoz-Martn A.   Prieto C.   Miranzo P.   Osendi M.I.   Garca-Lopez J.   Respaldiza M.A.  

Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. : 513-518

Elsevier

Access to resources Recommend Favorite

Dielectric properties of RF-sputtered silicon nitride thin films with gold electrodes

By Gould R.D.   Awan S.A.  

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 309-314

Elsevier

Access to resources Recommend Favorite

Optical investigation of silicon nitride thin films deposited by r.f. magnetron sputtering

By Xu G.   Jin P.   Tazawa M.   Yoshimura K.  

Thin Solid Films, Vol. 425, Iss. 1, 2003-02 ,pp. : 196-202

Elsevier

Access to resources Recommend Favorite

Thermal stability of copper nitride films prepared by rf magnetron sputtering

By Liu Z.Q.   Wang W.J.   Wang T.M.   Chao S.   Zheng S.K.  

Thin Solid Films, Vol. 325, Iss. 1, 1998-07 ,pp. : 55-59

Elsevier

Access to resources Recommend Favorite