Investigation of scaling-up issues in hot-wire CVD of polycrystalline silicon

Author： van der Werf C.H.M.   Hardeman A.J.   van Veenendaal P.A.T.T.   van Veen M.K.   Rath J.K.   Schropp R.E.I.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 41-45

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