Effect of deposition conditions and dielectric plasma treatments on the electrical properties of microcrystalline silicon TFTs

Author: Kasouit S.   Roca i Cabarrocas P.   Vanderhaghen R.   Bonassieux Y.   Elyaakoubi M.   French I.   Rocha J.   Vitoux B.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.427, Iss.1, 2003-03, pp. : 67-70

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Abstract