Microcrystalline silicon for solar cells deposited at high rates by hot-wire CVD

By Iwaniczko E.   Xu Y.   Schropp R.E.I.   Mahan A.H.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 212-215

Elsevier

Access to resources Recommend Favorite

Highly conductive microcrystalline silicon carbide films deposited by the hot wire cell method and its application to amorphous silicon solar cells

By Miyajima S.   Yamada A.   Konagai M.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 274-277

Elsevier

Access to resources Recommend Favorite

Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD

By Fonrodona M.   Gordijn A.   van Veen M.K.   van der Werf C.H.M.   Bertomeu J.   Andreu J.   Schropp R.E.I.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 145-148

Elsevier

Access to resources Recommend Favorite

Electrical transport properties of microcrystalline silicon thin films prepared by Cat-CVD

By Liu F.   Zhu M.   Feng Y.   Han Y.   Liu J.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 97-100

Elsevier

Access to resources Recommend Favorite

Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD

By Niikura C.   Kim S.Y.   Drevillon B.   Poissant Y.   Roca i Cabarrocas P.   Bouree J.E.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 178-183

Elsevier

Access to resources Recommend Favorite