Boron diffusion into nitrogen doped silicon films for P + polysilicon gate structures

Author： Mansour F.   Mahamdi R.   Jalabert L.   Temple-Boyer P.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.434, Iss.1, 2003-06, pp. : 152-156

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