A simple modification of the magnetron sputtering method for the deposition of boron-doped hydrogenated microcrystalline silicon films with enhanced doping efficiency

By Sharma S.N.   Das D.   Banerjee R.  

Thin Solid Films, Vol. 298, Iss. 1, 1997-04 ,pp. : 200-210

Elsevier

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Electrical transport properties of microcrystalline silicon thin films prepared by Cat-CVD

By Liu F.   Zhu M.   Feng Y.   Han Y.   Liu J.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 97-100

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Electronic and topographic properties of amorphous and microcrystalline silicon thin films

By Kleider J.P.   Longeaud C.   Bruggemann R.   Houze F.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 57-60

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Photoelectrical properties of microcrystalline silicon films

By Forsh P.A.   Kazanskii A.G.   Mell H.   Terukov E.I.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 251-253

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Hydrogen bonding properties in nitrogen doped microcrystalline silicon and amorphous silicon prepared using highly diluted silane

By Ehara T.  

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