Author: Lee S.-H. Hyun Yoon K. Cheong D.-S. Lee J.-K.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 193-198
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Surface roughness of alumina films deposited by reactive r.f. sputtering
By Zhao Y. Qian Y. Yu W. Chen Z.
Thin Solid Films, Vol. 286, Iss. 1, 1996-09 ,pp. :
Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of TiAlN films
By Shew B.-Y. Huang J.-L. Lii D.-F.
Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. :
Oxidation behavior of (Ti 1-x Al( x ))N films prepared by r.f. reactive sputtering
By Inoue S. Uchida H. Koterazawa K. Yoshinaga Y.
Thin Solid Films, Vol. 300, Iss. 1, 1997-05 ,pp. :