Relationship between residual stress and structural properties of AlN films deposited by r.f. reactive sputtering

Author: Lee S.-H.   Hyun Yoon K.   Cheong D.-S.   Lee J.-K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.435, Iss.1, 2003-07, pp. : 193-198

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Abstract