Growth and nanostructure of InN thin films deposited by reactive magnetron sputtering

By Takai O.   Ikuta K.   Inoue Y.  

Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 148-150

Elsevier

Access to resources Recommend Favorite

Morphological properties of AlN piezoelectric thin films deposited by DC reactive magnetron sputtering

By Xu X.-H.   Wu H.-S.   Zhang C.-J.   Jin Z.-H.  

Thin Solid Films, Vol. 388, Iss. 1, 2001-06 ,pp. : 62-67

Elsevier

Access to resources Recommend Favorite

Optical and electrical properties of InN thin films grown on ZnO/ -Al 2 O 3 by RF reactive magnetron sputtering

By Ikuta K.   Inoue Y.   Takai O.  

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 49-53

Elsevier

Access to resources Recommend Favorite

Phase transition and properties of Ti-Al-N thin films prepared by r.f.-plasma assisted magnetron sputtering

By Zhou M.   Makino Y.   Nose M.   Nogi K.  

Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. : 203-208

Elsevier

Access to resources Recommend Favorite

Influences of bias voltage on the crystallographic orientation of AlN thin films prepared by long-distance magnetron sputtering

By Chu A.K.   Chao C.H.   Lee F.Z.   Huang H.L.  

Thin Solid Films, Vol. 429, Iss. 1, 2003-04 ,pp. : 1-4

Elsevier

Access to resources Recommend Favorite