Composite Ag/C:H films prepared by DC planar magnetron deposition

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Characterization of an unbalanced magnetron for composite film (metal/C:H) deposition

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Vacuum, Vol. 52, Iss. 4, 1999-04 ,pp. : 415-420

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Composite metal/C:H films prepared in an unbalanced magnetron

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Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

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Effects of gas composition and r.f. power on properties of a-C:H/SiC:H composite films grown by plasma-enhanced chemical vapor deposition

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