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Electronic properties of ion irradiated amorphous carbon films prepared by plasma assisted CVD method

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Structure of plasma-deposited amorphous hydrogenated boron-carbon thin films

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High-stability hydrogenated amorphous silicon films for light-soaking prepared by catalytic CVD at high deposition rates

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Growth kinetics of hydrogenated amorphous silicon carbide films by RF plasma-enhanced CVD using two kinds of source materials

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