Deposition and characterization of nitrogen containing stainless steel coatings prepared by reactive magnetron sputtering

Author： Schneider J.M. Rebholz C. Voevodin A.A. Leyland A. Matthews A.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.47, Iss.9, 1996-09, pp. : 1077-1080

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Deposition and characterisation of carbon-containing tungsten coatings prepared by reactive magnetron sputtering

By Rebholz C. Schneider J.M. Ziegele H. Rahle B. Leyland A. Matthews A.

Vacuum, Vol. 49, Iss. 4, 1998-04 ,pp. : 265-272

Elsevier

Access to resources Recommend Favorite

Characterization of CN x films prepared by reactive magnetron sputtering

By Togashi Y. Hirohata Y. Hino T.

Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 391-395

Elsevier

Access to resources Recommend Favorite

Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties

By Kawamura M. Abe Y. Yanagisawa H. Sasaki K.

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 115-119

Elsevier

Access to resources Recommend Favorite

Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering

By Nosaka T. Yoshitake M. Okamoto A. Ogawa S. Nakayama Y.

Thin Solid Films, Vol. 348, Iss. 1, 1999-07 ,pp. : 8-13

Elsevier

Access to resources Recommend Favorite

Nanostructure of ZnO thin films prepared by reactive rf magnetron sputtering

By Takai O. Futsuhara M. Shimizu G. Lungu C.P. Nozue J.

Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 117-119

Elsevier

Access to resources Recommend Favorite