Properties of palladium silicide thin films obtained by vacuum rapid thermal annealing of r.f. sputtered Pd films on Si

Author: Beshkov G.   Dimitrov D.B.   Koprinarova J.   Gesheva K.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.2, 1998-10, pp. : 177-180

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Abstract