RBS and channeling analysis of cobalt disilicide layers produced by focused ion beam implantation

Author: Teichert J.   Voelskow M.   Bischoff L.   Hausmann S.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.51, Iss.2, 1998-10, pp. : 261-266

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Abstract