Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

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Thin Solid Films, Vol. 424, Iss. 1, 2003-01 ,pp. : 103-106

Elsevier

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Effects of ion beam bombardment on electrochromic tungsten oxide films studied by X-ray photoelectron spectroscopy and Rutherford back-scattering

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Photoinduced effects in RF and VHF a-Si:H films deposited with different ion bombardment

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Limits of validity of the crystallite group method in stress determination of thin film structures

By Gergaud P.   Labat S.   Thomas O.  

Thin Solid Films, Vol. 319, Iss. 1, 1998-04 ,pp. : 9-15

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A method for in situ measurement of the residual stress in thin films by using the focused ion beam

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