Morphology and structure of nanocrystalline p-doped silicon films produced by hot wire technique

By Ferreira I.   Cabrita A.   Braz Fernandes F.   Fortunato E.   Martins R.  

Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. : 237-243

Elsevier

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Preparation of silicon-carbon alloy films by hot-wire CVD and their properties

By Itoh T.   Katoh Y.   Fujiwara T.   Fukunaga K.   Nonomura S.   Nitta S.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 240-243

Elsevier

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Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD

By Soler D.   Fonrodona M.   Voz C.   Bertomeu J.   Andreu J.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 189-191

Elsevier

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The role of hydrogen dilution of silane and phosphorus doping on hydrogenated microcrystalline silicon ( c-Si:H) films prepared by hot-wire chemical vapor deposition (HW-CVD) technique

By Jadkar S.R.   Sali J.V.   Takwale M.G.   Musale D.V.   Kshirsagar S.T.  

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 206-212

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Poly-crystalline silicon thin films prepared by plasma-assisted hot-wire chemical vapor deposition

By Liu F.   Zhu M.   Liu J.   Wang L.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 182-185

Elsevier

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