Characterisation of ZrO 2 films prepared by rf reactive sputtering at different O 2 concentrations in the sputtering gases

Author： Gao P.   Meng L.J.   dos Santos M.P.   Teixeira V.   Andritschky M.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.56, Iss.2, 2000-02, pp. : 143-148

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