Deposition of thin films of different oxides of copper by RF reactive sputtering and their characterization

Author: Ghosh S.   Avasthi D.K.   Shah P.   Ganesan V.   Gupta A.   Sarangi D.   Bhattacharya R.   Assmann W.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.57, Iss.4, 2000-06, pp. : 377-385

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Abstract