Influence of vacuum rapid thermal annealing on the properties of PCVD SiO 2 and SiO 2 .P 2 O 5 films

Author: Dimitrov D.B.   Beshkova M.   Dafinova R.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.58, Iss.2, 2000-08, pp. : 485-489

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Abstract