Is there a way to improve the uniformity of TiN deposition conditions in large pulsed d.c. plasma CVD reactors?

Author： Kugler C. Bauer F. Laimer J. Stori H.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.61, Iss.2, 2001-05, pp. : 379-383

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