Author: Homyara H. Ahmad S. Ikezawa S. Baba K. Yoshioka T. Ninomiya Y. Nakamura K. Famakinwa T. Oda H. Yoshimura K. Taoda H. Fujii S. Hara T.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 203-207
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Ikezawa S. Mutsuga F. Kubota T. Suzuki R. Baba K. Koh S. Yoshioka T. Nishiwaki A. Kida K. Ninomiya Y. Wakita K.
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :
Plasma physics and technology; industrial applications
Vacuum, Vol. 64, Iss. 3, 2002-01 ,pp. :
Polyimide transmitted E-beam excited CF 4 plasma etching
By Yamada T. Inanami R. Morita S.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :