Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

By Piazza F.   Arnal Y.   Grambole D.   Herrmann F.   Kildemo M.   Lacoste A.   Relihan G.   Golanski A.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 196-199

Elsevier

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Thermoluminescent a-CN thin films properties as a function of plasma parameters

By Escobar-Alarcón L.   Camps E.   Romero S.   Olea-Mejía O.   Muhl S.   Arrieta A.   Haro-Poniatowski E.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1133-1135

Springer Publishing Company

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Effect of process parameters on the mechanical properties of carbon nitride thin films synthesized by plasma assisted pulsed laser deposition

By Tabbal M.   Mérel P.   Chaker M.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1365-1367

Springer Publishing Company

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Dependence of the physical properties of SiN x :H films deposited by the ECR plasma method on the discharge size

By Garcia S.   Martin J.M.   Martil I.   Gonzalez-Diaz G.  

Thin Solid Films, Vol. 315, Iss. 1, 1998-03 ,pp. : 22-28

Elsevier

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Properties of a-Si:H films grown using hot wire-ECR plasma techniques

By Dalal V.L.   Seberger P.   Ring M.   Sharma P.  

Thin Solid Films, Vol. 430, Iss. 1, 2003-04 ,pp. : 91-94

Elsevier

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