Film properties of ZnO:Al films deposited by co-sputtering of ZnO:Al and contaminated Zn targets with Co, Mn and Cr

Author： Tominaga K. Takao T. Fukushima A. Moriga T. Nakabayashi I.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.66, Iss.3, 2002-08, pp. : 511-515

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