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Elsevier

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Dependence of the physical properties of SiN x :H films deposited by the ECR plasma method on the discharge size

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IR properties of SiO deposited on V 1-x W x O 2 thermochromic films by vacuum evaporation

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Rapid thermal annealing effects on plasma deposited SiO x :H films

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Composition, structure and luminescent properties of Eu x Y 2-x SiO 5 thin films

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