Physical properties of plasma deposited SiO x thin films

Author: San Andres E.   del Prado A.   Martil I.   Gonzalez G.   Martnez F.L.   Bravo D.   Lopez F.J.   Fernandez M.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.67, Iss.3, 2002-09, pp. : 525-529

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract