Technological innovation in low-dose SIMOX wafers fabricated by an internal thermal oxidation (ITOX) process

Author： Matsumura A. Hamaguchi I. Kawamura K. Sasaki T. Takayama S. Nagatake Y.

Publisher： Elsevier

ISSN： 0167-9317

Source： Microelectronic Engineering, Vol.66, Iss.1, 2003-04, pp. : 400-414

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