Growth characteristics of hydride-free chemical beam epitaxy and application to GaInP/GaAs heterojunction bipolar transistors

Author: Garcia J.   Dua C.   Mohammadi S.   Park J.   Pavlidis D.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.27, Iss.5, 1998-05, pp. : 442-445

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