Comparison of F 2 Plasma Chemistries for Deep Etching of SiC

Author： Leerungnawarat P.   Lee K.P.   Pearton S.J.   Ren F.   Chu S.N.G.  

Publisher： Springer Publishing Company

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.30, Iss.3, 2001-03, pp. : 202-206

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