Effect of Processing Conditions on Inversion Layer Mobility and Interface State Density in 4H-SiC MOSFETs

Author: Banerjee S.   Chatty K.   Chow T.P.   Gutmann R.J.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.30, Iss.3, 2001-03, pp. : 253-259

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Abstract