Electrical Activation Studies of Silicon-Implanted Al x Ga 1−x N with Aluminum Mole Fraction of 11% to 51%

Author: Moore E.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.40, Iss.1, 2011-01, pp. : 11-16

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content