Fabrication of ridge waveguide of 808 nm GaAs-based laser diodes by wet chemical etching

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Highly anisotropic, ultra-smooth patterning of GaN/SiC by low energy electron enhanced etching in DC plasma

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Catalyst and processing effects on metal-assisted chemical etching for the production of highly porous GaN

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Laser-induced direct etching of GaAs using chlorofluorocarbon (CFC) alternative gases

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