Polysilicon in situ phosphorus doping control over large concentration range using low temperature, low pressure chemical vapour deposition growth process

Author： Briand D.   Sarret M.   Le Bihan F.   Bonnaud O.   Pichon L.  

Publisher： Maney Publishing

ISSN： 1743-2847

Source： Materials Science and Technology, Vol.11, Iss.11, 1995-11, pp. : 1207-1209

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