Direct current superposed dual-frequency capacitively coupled plasmas in selective etching of SiOCH over SiC

Author： Yamaguchi Tsuyoshi   Komuro Tatsuya   Koshimizu Chishio   Takashima Seigo   Takeda Keigo   Kondo Hiroki   Ishikawa Kenji   Sekine Makoto   Hori Masaru  

Publisher： IOP Publishing

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.45, Iss.2, 2012-01, pp. : 25203-25209

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