Author： Peroz C Dhuey S Cornet M Vogler M Olynick D Cabrini S
Publisher： IOP Publishing
ISSN： 0957-4484
Source： Nanotechnology, Vol.23, Iss.1, 2012-01, pp. : 15305-15309
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Abstract
A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate.
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