Thickness Scaling of Pb(Zr,Ti)O3 Thin Films and Pt Electrodes for High Density FeRAM Devices

By Kim Seung-Hyun   Koo C. Y.   Ha S- M.   Woo H- J.   Park D- Y.   Lim J. E.   Hwang C. S.   Ha J.  

Integrated Ferroelectrics, Vol. 48, Iss. 1, 2002-01 ,pp. : 139-147

Taylor & Francis Ltd

Access to resources Recommend Favorite

Investigation of Alumina Barrier Layer for FeRAM Prepared by rf Magnetron Sputtering Method

By Jimbo Takehito   Miyaguchi Yuusuke   Kikuchi Shin   Kimura Isao   Tanimura Michio   Suu Koukou   Ishikawa Michio  

Integrated Ferroelectrics, Vol. 45, Iss. 1, 2002-01 ,pp. : 105-112

Taylor & Francis Ltd

Access to resources Recommend Favorite

PRE-ANNEALING EFFECTS ON AL METALLIZATION PROPERTIES IN HIGH DENSITY FeRAM DEVICE

By CHO K.   CHOI J.   YU H.   KWEON S.   YEOM S.   KIM N.   CHOI E.   SUN H.   HONG S.   HONG T.   KIM I.   LEE J.   UR S.   LEE Y.   RYU S.   CHOI S.  

Integrated Ferroelectrics, Vol. 81, Iss. 1, 2006-11 ,pp. : 113-122

Taylor & Francis Ltd

Access to resources Recommend Favorite

Constitution of titanium rich alloys of Ti–V–Fe–Al system

By Nwobu A. I. P.   Flower H. M.   West D. R. F.  

Materials Science and Technology, Vol. 7, Iss. 5, 1991-05 ,pp. : 391-398

Maney Publishing

Access to resources Recommend Favorite

Key Technologies for High Density FeRAM Applications

By Nagel N.   Kunishima I.  

Integrated Ferroelectrics, Vol. 48, Iss. 1, 2002-01 ,pp. : 127-137

Taylor & Francis Ltd

Access to resources Recommend Favorite