Plasmonic lithography for fabricating nanoimprint masters with multi-scale patterns

Author: Jung Howon   Kim Seok   Han Dandan   Jang Jinhee   Oh Seonghyeon   Choi Jun-Hyuk   Lee Eung-Sug   Hahn Jae W  

Publisher: IOP Publishing

E-ISSN: 1361-6439|25|5|55004-55010

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.25, Iss.5, 2015-05, pp. : 55004-55010

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

We successfully demonstrate the practical application of plasmonic lithography to fabricate nanoimprint masters. Using the properties of a non-propagating near-field, we achieve high-speed multi-scale patterning with different exposure time during the scanning. We modulate the width of the line patterns using a pulse light source with different duty cycles during the scanning of the probe. For practical application in plasmonic lithography, we apply a deep reactive ion etching process to transfer an arbitrary fluidic channel into a silicon substrate and fabricate a high-aspect-ratio imprint master. Subsequently, we carry out the imprint process to replicate the fluidic channel with an aspect ratio of 7.2. For pattern width below 100 nm, we adopt a three-layer structure of photoresist, hard layer, and polymer to record the near field and form a hard mask and transfer mask. Using the multilayer structure, we fabricate high-resolution nanoimprint masters in a silicon substrate with an aspect ratio greater than 1.