A PD-SOI based DTI-LOCOS combined cross isolation technique for minimizing TID radiation induced leakage in high density memory

Author: Fengying Qiao   Liyang Pan   Dong Wu   Lifang Liu   Jun Xu  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.35, Iss.2, 2014-02, pp. : 24003-24008

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