Mask design compensation for sloped sidewall structures fabricated by X-ray lithography

Author： Horade Mitsuhiro   Khumpuang Sommawan   Fujioka Kazuya   Sugiyama Susumu  

Publisher： Springer Publishing Company

ISSN： 0946-7076

Source： Microsystem Technologies, Vol.13, Iss.3-4, 2007-02, pp. : 215-219

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