Mask design compensation for sloped sidewall structures fabricated by X-ray lithography

By Horade Mitsuhiro   Khumpuang Sommawan   Fujioka Kazuya   Sugiyama Susumu  

Microsystem Technologies, Vol. 13, Iss. 3-4, 2007-02 ,pp. : 215-219

Springer Publishing Company

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Fabrication of RF MEMS variable capacitors by deep X-ray lithography and electroplating

By Achenbach Sven   Klymyshyn David   Haluzan Darcy   Mappes Timo   Wells Garth   Mohr Jürgen  

Microsystem Technologies, Vol. 13, Iss. 3-4, 2007-02 ,pp. : 343-347

Springer Publishing Company

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Micro gas bearings fabricated by deep X-ray lithography

By Kim D.   Lee S.   Jin Y.   Desta Y.   Bryant M. D.   Goettert J.  

Microsystem Technologies, Vol. 10, Iss. 6-7, 2004-10 ,pp. : 456-461

Springer Publishing Company

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Fluid filter fabricated by deep X-ray lithography for micro fluidics

By Ukita Yoshiaki   Asano Toshifumi   Utsumi Yuichi  

Microsystem Technologies, Vol. 13, Iss. 5-6, 2007-03 ,pp. : 435-439

Springer Publishing Company

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Why you will use the deep X-ray LIG(A) technology to produce MEMS?

By Meyer Pascal  

Microsystem Technologies, Vol. 14, Iss. 9-11, 2008-10 ,pp. : 1491-1497

Springer Publishing Company

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