In situ high temperature synchrotron-radiation diffraction studies of silicidation processes in nanoscale Ni layers

Author: Rinderknecht J.   Prinz H.   Kammler T.   Schell N.   Zschech E.   Wetzig K.   Gessner T.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.70, Iss.2, 2003-11, pp. : 226-232

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